Basic information:
Titanium silicide is widely used in the manufacture of gates, source/drain, interconnects and ohmic contacts for metal oxide semiconductors (MOS), metal oxide semiconductor field effect transistors (MOSFETs), and dynamic random memories (DRAMs): high purity, small particle size, uniform distribution, high specific surface area, high surface activity, and low bulk density.
Application:
1. Titanium silicide has a broad prospect of use in the field of microelectronics because of its low film resistivity, high melting point and stable chemical properties;
2. Aerospace and aviation industry, ship and submarine manufacturing, medical use, jewellery manufacturing;
3.Titanium disilicide has the advantages of low resistivity, high temperature resistance and good stability, etc. It can be widely used in microelectronics, aerospace high-temperature resistant materials and coating materials, etc., and has gradually become a hot spot for research in related fields.
Storage conditions
This product is vacuum-packed, should be sealed and stored in a dry, cool environment, should not be exposed to air for a long time, to prevent moisture agglomeration, affecting the dispersion performance and use of the effect.
Certificate
The products have been approved by FDA,REACH,ROSH,ISO and other certification, in line with national standards.
Advantage
Quality First
Competitive Price
First-class Production Line
Factory Origin
Customized Services
Factory
Packing
1kg/ bag; 25kg/ barrel;
20 tons/1×20‘FCL Shipment.
FAQ:
Q: Are you trading company or manufacturer ?
A: We are factory.
Q: How long is your delivery time?
A: Generally it is 5-10 days if the goods are in stock. or it is 15-20 days if the goods are not in stock, it is according to quantity.
Q: Do you provide samples ? is it free or extra ?
A: Yes, we could offer the sample for free charge but do not pay the cost of freight.
Q: What is your terms of payment ?
A: Payment<=1000USD, 100% in advance. Payment>=1000USD, 30% T/T in advance ,balance before shippment.